Department of Chemistry

Seton Hall University

South Orange, NJ 07079-2694

Telephone: (201)-761-9036

Education

1984 B.S., Chemistry and Geology, departmental honors, Summa Cum Laude.

Texas Christian University, Fort Worth, TX.

1990 Ph.D., Chemistry.

California Institute of Technology, Pasadena, CA.

Thesis Title: I. Matrix Isolation of 1,1-Diazenes. II. Distance, Temperature, and Dynamic Solvent Effects on Electron Transfer Reactions

Thesis Advisor: Dr. Peter B. Dervan.

Research and Teaching Experience

1997-

Associate Professor of Chemistry, Seton Hall University, South Orange, NJ.

Organic and polymer photochemistry; photoacid and photobase

generators; dendritic polymers; microlithography; molecular imprinting.

1991-1997

Assistant Professor of Chemistry, Seton Hall University, South Orange, NJ.

Organic and polymer chemistry.

1989-1991

Postdoctoral Member of Technical Staff, AT&T Bell Laboratories, Murray Hill, NJ.

Synthesis and evaluation of specialty polymers for deep UV and X-ray

microlithography, development of new photoacid generating compounds.

Publications

1. "Synthesis and Characterization of Poly(4-t-Butoxycarbonyloxystyrene-sulfone)"

R.S.Kanga, J.M.Kometani, E.Reichmanis, J.E.Hanson, O.Nalamasu, L.F.Thompson,

S.A.Heffner, W.W.Tai, P.Trevor, Chemistry of Materials, 1991, 3, 660-667.

2. "Single Component Chemically Amplified Resist Materials for Electron-beam and X-ray

Lithography" A.E.Novembre, W.W.Tai, J.M.Kometani, J.E.Hanson, O.Nalamasu, G.N.Taylor,

E.Reichmanis, and L.F.Thompson, SPIE: Advances in Resist Technology and Processing

VIII, 1991, 1466, 89-99

3. "PTBSS: A High Resolution Single Component Aqueous Base Soluble Chemically

Amplified Resist" A.E.Novembre, W.W.Tai, J.M.Kometani, J.E.Hanson, O.Nalamasu, G.N.Taylor,

E.Reichmanis, L.F.Thompson Journal of Vacuum Science and Technology B 1991, 9,

3338-3342.

4. "Radiation-Induced Chemistry of Poly(4-[(tert-butoxycarbonyl)oxy]styrene-(co-sulfur

dioxide))" A.E.Novembre, W.W.Tai, J.M.Kometani, J.E.Hanson, O.Nalamasu, G.N.Taylor,

E.Reichmanis, L.F.Thompson Chemistry of Materials , 1992, 4, 278-284.

5. "Lithographic Properties of Single- and Multi-component Chemically Amplified Resists

Based on Copolymers of 4-t-Butoxycarbonyloxystyrene (TBS) and Sulfur Dioxide (SO2)"

A.E.Novembre, J.E.Hanson, J.M.Kometani, W.W.Tai, O.Nalamasu, G.N.Taylor,

E.Reichmanis, L.F.Thompson, D.Tomes Microcircuit Engineering 1992, 17, 257-262.

6. "Synthesis and Evaluation of Copolymers of 4-t-Butoxycarbonyloxystyrene and 2-Nitro-

benzylstyrene Sulfonates: Single Component Chemically Amplified Deep UV Imaging

Materials" J.E.Hanson, E.Reichmanis, F.M.Houlihan, T.X.Neenan Chemistry of Materials , 1992,

4, 837-842.

7. "Arylmethyl Sulfones: A New Class of Photoacid Generators"

A.E.Novembre, J.E.Hanson, J.M.Kometani, W.W.Tai, E.Reichmanis, L.F.Thompson,

R.J.West Polymer Engineering and Science , 1992, 32, 1476-1480.

8. "Effect of Post-Exposure Delay in Positive Acting Chemically Amplified Resists: An

Analytical Study" O.Nalamasu, E.Reichmanis, J.E.Hanson, R.S.Kanga, L.A.Heimbrook, A.B.Emerson,

F.A. Baiocci, and S.Vaidya. Polymer Engineering and Science , 1992, 32, 1565-1570.

9. "X-ray and Deep UV Radiation Response of t-BOC Protected 4-Hydroxystyrene-Sulfone

Copolymers" A.E.Novembre, J.E.Hanson, J.M.Kometani, W.W.Tai, E.Reichmanis in "Irradiation

of Polymeric Materials" ACS Symposium Series #527, Reichmanis, O'Donnell, and

Frank, editors.

10. "Sensitivity Enhancement of t-BOC Based Chemically Amplified Resists Through

Optimization of Process Prebake Conditions" A.E.Novembre, J.M.Kometani, W.W.Tai, E.Reichmanis, L.F.Thompson, J.E.Hanson

Journal of Photopolymer Science and Technology 1992, 5, 9-15.

11. "t-BOC Based Resists: A Polymeric Platform for 0.25 mm Lithographic Technologies"

O.Nalamasu, A.E.Novembre, J.M.Kometani, J.E.Hanson Journal of Photopolymer

Science and Technology 1993, 6, 457-472.

12. "The 1.4 and 248 nm Radiation Response of Chemically Amplified Resists Containing

Arylmethyl Sulfone Photoacid Generators" J.E.Hanson, D.A.Pingor, A.E.Novembre, J.M.Kometani, W.W.Tai Polymers for

Advanced Technology 1994, 5, 49-55.

13. "Weak Temperature Dependence of Electron Transfer Rates in Fixed-Distance Porphyrin-

Quinone Model Systems" L.R.Khundkar, J.W.Perry, J.E.Hanson, P.B.Dervan. Journal of the American Chemical

Society 1994, 116, 9700-9709.

14. "Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium

Salts" J.E.Hanson, K.H.Jensen, N.Gargiulo, D.Motta, D.A.Pingor, A.E.Novembre,

D.A.Mixon, J.M.Kometani, C.Knurek in ACS Symposium Series No. 614,

Microelectronics Technology: Polymers for Advanced Imaging and Packaging,

E.Reichmanis, C.K.Ober, S.A.MacDonald, T.Iwayanagi, and T.Nishikubo eds.

American Chemical Society: Washington DC, 1995, 137-148.

Patents

U.S. Patent 5,374,504 "Resist Materials and Processes of Their Use"

J.E.Hanson and A.E.Novembre (issued December 20, 1994)


Honors and Awards

1980-1984 Chancellor's Scholarship, Texas Christian University, Fort Worth, TX.

1983 Phi Beta Kappa, Texas Christian University, Fort Worth, TX.

1984 Senior Scholar in Chemistry, Texas Christian University, Fort Worth, TX.

1984 Sigma Xi Award, Texas Christian University, Fort Worth, TX.

1985-1988 National Science Foundation Predoctoral Fellow, California Institute of

Technology, Pasadena, CA.